Applied Materials
Applied Materials PVD 是美国 Applied Materials（应用材料公司） 推出的 物理气相沉积系统，用于在硅晶圆或其他基片上沉积高纯度、均匀且可控厚度的金属或介质薄膜。PVD 是现代集成电路互连层（Cu/Al/Ti/W 等金属）、阻挡层、接触层以及一些功能性薄膜制备的关键工艺装备
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